METHOD OF FORMING A LAYER OF MATERIAL USING AN ATOMIC LAYER DEPOSITION PROCESS,申请号KR20097000476-传众专利搜索

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发明名称	METHOD OF FORMING A LAYER OF MATERIAL USING AN ATOMIC LAYER DEPOSITION PROCESS
摘要
申请公布号	KR101199055(B1)	申请公布日期	2012.11.07
申请号	KR20097000476	申请日期	2007.05.17
申请人		发明人
分类号	C23C16/455;C23C16/509;H01L21/205	主分类号	C23C16/455
代理机构		代理人
主权项
地址

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