| 摘要 |
PURPOSE: A method for forming an overlay vernier is provided to prevent a vernier from being damaged due to a chemical mechanical polishing process by changing the overlay vernier into a box type before the chemical mechanical polishing process. CONSTITUTION: A line and space pattern is composed of a line protruding from a substrate and a space between lines. A hard mask layer fills the space of the line and space pattern. A mask pattern is formed on the hard mask layer. The line of the line and space pattern is removed using the mask pattern as an etch mask. A box type of a single square is formed by removing the hard mask layer.
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