| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid developer for a thick film resist, developing a thick film resist without residue while corrosion of a metal film is restrained. <P>SOLUTION: This liquid developer for a thick film resist contains a basic compound (a) and a polyhydric alcohol (b), wherein the polyhydric alcohol (b) is contained at a concentration equal to or more than 3 mass% and under 20 mass% to the whole quantity of the liquid developer for the thick film resist. Especially it is preferable to select the polyhydric alcohol (b) from glyceline, propylene glycol and ethylene glycol. <P>COPYRIGHT: (C)2010,JPO&INPIT |
