发明名称 |
SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY |
摘要 |
Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled. |
申请公布号 |
EP2374145(A4) |
申请公布日期 |
2012.11.07 |
申请号 |
EP20100729436 |
申请日期 |
2010.01.06 |
申请人 |
BREWER SCIENCE, INC. |
发明人 |
LIN, QIN;PULIGADDA, RAMA;CLAYPOOL, JAMES;GUERRERO, DOUGLAS, J.;SMITH, BRIAN |
分类号 |
H01L21/027;G03F7/20;G03F7/40 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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