| 摘要 |
PURPOSE: An imprint device, an imprint method and a device manufacturing method are provided to precisely transfer a pattern to resin supplied to a substrate despite the local distortion of the substrate. CONSTITUTION: An imprint device uses a mold in which a pattern is formed. A substrate holding mechanism is divided into a plurality of areas. The substrate holding mechanism changes adhesion for adsorbing a respective substrate(1) on the areas. The substrate holding mechanism holds the substrate. A control unit(100) controls an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another. The control unit makes the adhesion in the area of the substrate holding mechanism smaller than the adhesion at the imprint operation. |
