| 摘要 |
PURPOSE: A method for manufacturing an electrostatic chuck, the electrostatic chuck, and a plasma processing device are provided to prevent damage due to plasma attack by thickening a reinforcement insulation layer than a base insulation layer. CONSTITUTION: An electrostatic chuck includes an electrostatic chuck body(121) and an insulation member. The insulation member includes a plurality of insulation segments(131) which surround the electrostatic chuck body. A reinforcement insulation layer(128) is formed on the outer surface of the electrostatic chuck body to correspond to the combination part of the insulation segments. An insulation part includes a base insulation layer(127) formed on the area except the reinforcement insulation layer. The reinforcement insulation layer is thicker than the base insulation layer. |
