发明名称 Method of producing MoCr sputtering target material and MoCr sputtering target material
摘要 PURPOSE: A MoCr target material and a manufacturing method thereof are provided to produce a low-oxygen MoCr target which hardly induces particles or splash. CONSTITUTION: A method for manufacturing a MoCr target material comprises the steps of: pulverizing a sintered Mo body to an average particle diameter of 20-500Mm to make Mo powder, heat-treating the Mo powder in a reductive atmosphere, preparing Cr powder having an average particle diameter of 20-500Mm, mixing the reduced Mo powder with the Cr powder, and pressing and sintering the mixed powder to obtain a sintered MoCr body.
申请公布号 KR20120122898(A) 申请公布日期 2012.11.07
申请号 KR20120039078 申请日期 2012.04.16
申请人 发明人
分类号 C23C14/34;B22F3/12;C22C27/04;C22C27/06 主分类号 C23C14/34
代理机构 代理人
主权项
地址