| 发明名称 |
High throughput thermal treatment system and method of operating |
| 摘要 |
A high throughput thermal treatment system for processing a plurality of substrates is described. The thermal treatment system is configured to thermally treat a plurality of substrates chemically treated in a dry, non-plasma environment. |
| 申请公布号 |
US8303715(B2) |
申请公布日期 |
2012.11.06 |
| 申请号 |
US20080183763 |
申请日期 |
2008.07.31 |
| 申请人 |
HAMELIN THOMAS;LAFLAMME, JR. ARTHUR H.;WHYMAN GREGORY R.;TOKYO ELECTRON LIMITED |
发明人 |
HAMELIN THOMAS;LAFLAMME, JR. ARTHUR H.;WHYMAN GREGORY R. |
| 分类号 |
C23F1/08;B08B7/00 |
主分类号 |
C23F1/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
