发明名称 Film stress management for MEMS through selective relaxation
摘要 An apparatus comprising a microelectromechanical system. The microelectromechanical system includes a crystalline structural element having dislocations therein. For at least about 60 percent of adjacent pairs of the dislocations, direction vectors of the dislocations form acute angles of less than about 45 degrees.
申请公布号 US8304276(B2) 申请公布日期 2012.11.06
申请号 US201213358615 申请日期 2012.01.26
申请人 WATSON GEORGE PATRICK;ALCATEL LUCENT 发明人 WATSON GEORGE PATRICK
分类号 H01L21/00 主分类号 H01L21/00
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