| 摘要 |
<p>PURPOSE: A film layer etching method and a laser lithography device thereof are provided to reduce a manufacturing cost by using a patterning process of a single phase. CONSTITUTION: Laser devices(10) emit laser beams onto a surface of a structure(100) through a focal lens group. The structure is placed on a positioning platform. Driving motors(31,32) are controlled by a control device and output torque to the focal lens group to project the laser beams into a preset part of the surface of the structure.</p> |
