发明名称 |
Method and system for design of a reticle to be manufactured using variable shaped beam lithography |
摘要 |
A method for fracturing or mask data preparation or proximity effect correction of a pattern to be formed on a surface is disclosed in which a plurality of variable shaped beam (VSB) shots are determined, and in which charged particle beam simulation is used to calculate the pattern which the plurality of VSB shots will form on the surface. At least two shots in the plurality of VSB shots overlap each other. In some embodiments, assigned dosages of at least two shots differ before proximity effect correction (PEC). In other embodiments an optimization technique may be used embodiments.
|
申请公布号 |
US8304148(B2) |
申请公布日期 |
2012.11.06 |
申请号 |
US201113316564 |
申请日期 |
2011.12.12 |
申请人 |
FUJIMURA AKIRA;GLASSER LANCE;D2S, INC. |
发明人 |
FUJIMURA AKIRA;GLASSER LANCE |
分类号 |
G03F1/20 |
主分类号 |
G03F1/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|