| 摘要 |
<p>PURPOSE: A lithography apparatus and a surface cleaning method are provided to overcome the pollution of the lithographic apparatus due to top coat materials, substrate materials, and/or other pollutants. CONSTITUTION: A lithography apparatus includes a liquid handling system(12) and a controller(30). The liquid handling system restricts immersion liquid in a space between the final element of a projection system and a substrate(W) and/or a table. The liquid handling system includes a liquid opening part and a supplying inlet(10). The liquid opening part introduces liquid into a space between the system and the substrate and/or the table and extracts liquid from the space. The supplying inlet is positioned at the radially external side of the liquid opening part. The controller controls the flowing direction of the liquid through the liquid opening part.</p> |
