| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blank suited for manufacturing substrate digging type phase shift masks, including a light-shielding film pattern of a tantalum-based material. <P>SOLUTION: A mask blank 100 used for manufacturing substrate digging type phase shift masks has a configuration in which a light shielding film 8, and an etching mask film 5 are sequentially superposed on a translucent substrate 1. The light shielding film 8 is formed in contact with a translucent substrate 1, and comprises a material consisting primarily of tantalum and substantially including no oxygen. The etching mask film 5 comprises a material having the content of chromium of 45 at% or more and the content of oxygen of 30 at% or less. <P>COPYRIGHT: (C)2013,JPO&INPIT |
