发明名称 VENTILATION GAS MANAGEMENT SYSTEMS AND PROCESSES
摘要 A ventilation gas management system and process for an enclosure adapted to contain fluid supply vessel(s) and through which ventilation gas is flowed to provide safe operation in the event of leakage of fluid from a vessel. Ventilation gas flow is modulated to accommodate various hazard levels associated with the deployment and operation of such enclosure containing fluid supply vessel(s), e.g., a gas box or gas cabinet in a semiconductor manufacturing facility, thereby achieving reduction in ventilation gas requirements otherwise required for such deployment and operation.
申请公布号 KR20120120297(A) 申请公布日期 2012.11.01
申请号 KR20127021217 申请日期 2011.01.11
申请人 发明人
分类号 B01D53/30;B01D46/44;F24F11/00;H01L21/02 主分类号 B01D53/30
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