| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive pellicle film suited to a lithography process of applying ultraviolet light including i line, h line and g line and having a wavelength region of 350-450 nm, and having light resistance. <P>SOLUTION: The pellicle film for pellicles is used in a lithography process for applying ultraviolet light with the wavelength range of 350-450 nm. The pellicle film includes, on the surface of a raw material pellicle film 21 at least in an exposure light source side, an ultraviolet light absorbing layer 22 that has an average transmittance of 90% or more to the ultraviolet light with the wavelength region of 350-450 mm, and an average transmittance of 50% or less to the ultraviolet light with the wavelength region of 200-300 nm. <P>COPYRIGHT: (C)2013,JPO&INPIT |
