发明名称 |
PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To reduce a correction error due to a time lag of response speed between light volume senor output and sensor output for obtaining an image. <P>SOLUTION: A pattern inspection device 100 comprises a light source 103; an illumination optical system 170 for illuminating a laser beam to a sample to be inspected; a light volume sensor 144 for measuring the light volume of the laser beam; a TDI sensor 105 for imaging an optical image of a pattern; a memory device 140 for temporarily storing output data of the TDI sensor 105 for a period of time difference with an output timing, when the output timing of the TDI sensor 105 is early; a memory device 142 for temporarily storing output data of the light volume sensor 144 during a period of the time difference with the output timing when the output timing of the light volume sensor 144 is early; a correction circuit 148 for correcting a gradation value of the optical image by using a light volume value outputted at time shifted by the time difference; and a comparison circuit 108 for inputting a reference image which is a comparison contrast and comparing the optical image correcting the gradation value with the reference image by pixel unit. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012211834(A) |
申请公布日期 |
2012.11.01 |
申请号 |
JP20110077812 |
申请日期 |
2011.03.31 |
申请人 |
NUFLARE TECHNOLOGY INC |
发明人 |
OGAWA TSUTOMU;ISOMURA IKUNAO |
分类号 |
G01N21/956;G01B11/30;G03F1/84 |
主分类号 |
G01N21/956 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|