发明名称 PATTERN INSPECTION DEVICE AND PATTERN INSPECTION METHOD
摘要 <P>PROBLEM TO BE SOLVED: To reduce a correction error due to a time lag of response speed between light volume senor output and sensor output for obtaining an image. <P>SOLUTION: A pattern inspection device 100 comprises a light source 103; an illumination optical system 170 for illuminating a laser beam to a sample to be inspected; a light volume sensor 144 for measuring the light volume of the laser beam; a TDI sensor 105 for imaging an optical image of a pattern; a memory device 140 for temporarily storing output data of the TDI sensor 105 for a period of time difference with an output timing, when the output timing of the TDI sensor 105 is early; a memory device 142 for temporarily storing output data of the light volume sensor 144 during a period of the time difference with the output timing when the output timing of the light volume sensor 144 is early; a correction circuit 148 for correcting a gradation value of the optical image by using a light volume value outputted at time shifted by the time difference; and a comparison circuit 108 for inputting a reference image which is a comparison contrast and comparing the optical image correcting the gradation value with the reference image by pixel unit. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012211834(A) 申请公布日期 2012.11.01
申请号 JP20110077812 申请日期 2011.03.31
申请人 NUFLARE TECHNOLOGY INC 发明人 OGAWA TSUTOMU;ISOMURA IKUNAO
分类号 G01N21/956;G01B11/30;G03F1/84 主分类号 G01N21/956
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