| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus with a deformation sensor which uses low volume and is cost effective, or an alternative deformation sensor. <P>SOLUTION: A lithographic apparatus includes: an illumination system configured to adjust a radiation beam; a support medium constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a deformation sensor to determine deformations of an object of the lithographic apparatus. The deformation sensor includes at least one optical fiber arranged on or in the object, the optical fiber including one or more Bragg gratings, and an interrogation system to interrogate the one or more Bragg gratings. <P>COPYRIGHT: (C)2013,JPO&INPIT |
