发明名称 |
METHODS OF INSPECTING AND MANUFACTURING SEMICONDUCTOR WAFERS |
摘要 |
A method of manufacturing a plurality of semiconductor wafers comprising micro-inspecting at least one location within at least one micro-inspected pattern field and determining at least one parameter value representing a property of the wafer at the micro-inspected location, macro-inspecting a plurality of locations within the at least one micro-inspected pattern field and determining, for each macro-inspected location of the macro-inspected pattern field, at least one parameter value representing the property of the wafer at the macro-inspected location based on the light intensity recorded for the macro- inspected location and on the at least one parameter value representing the property of the wafer at the micro-inspected location of this pattern field. |
申请公布号 |
WO2012146395(A1) |
申请公布日期 |
2012.11.01 |
申请号 |
WO2012EP01858 |
申请日期 |
2012.04.30 |
申请人 |
NANDA TECHNOLOGIES GMBH;MARKWORT, LARS;GUITTET, PIERRE-YVES |
发明人 |
MARKWORT, LARS;GUITTET, PIERRE-YVES |
分类号 |
G01N21/956;H01L21/66 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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