SUBSTRATE PROCESSING APPARATUS AND CLEANING DEVICE OF THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a cleaning device of a substrate processing apparatus which cleans a portion contacting with a substrate even in the substrate processing apparatus that does not have a rotation mechanism.

SOLUTION: A cleaning device 2 comprises: a base 400 having the same outer shape with a wafer W that is processed; a brush 402 implanted in a peripheral part of a lower surface of the base 400 facing downward and serving as a cleaning tool; and a vibration generation apparatus 404 serving as a driving source operating the brush 402. The vibration generation apparatus 404 of the cleaning device 2 vibrates on a hand 11 to vibrate the brush 402. The brush 402 cleans a support surface 86a of a wafer supporting member 81 of the hand 11 through the vibrations.

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