发明名称 |
COMPOSITE SUBSTRATE HAVING SINGLE-CRYSTAL SILICON CARBIDE SUBSTRATE |
摘要 |
A first vertex of a first single-crystal silicon carbide substrate and a second vertex of a second single-crystal silicon carbide substrate abut each other such that a first side of the first single-crystal silicon carbide substrate and a second side of the second single-crystal silicon carbide substrate are aligned. In addition, at least a part of the first side and at least a part of the second side abut on a third side of a third single-crystal silicon carbide substrate. Thus, in manufacturing a semiconductor device including a composite substrate, process fluctuations caused by a gap between the single-crystal silicon carbide substrates can be suppressed.
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申请公布号 |
US2012273800(A1) |
申请公布日期 |
2012.11.01 |
申请号 |
US201113395494 |
申请日期 |
2011.06.17 |
申请人 |
HORI TSUTOMU;HARADA SHIN;INOUE HIROKI;SASAKI MAKOTO;ITOH SATOMI;NAMIKAWA YASUO;SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
HORI TSUTOMU;HARADA SHIN;INOUE HIROKI;SASAKI MAKOTO;ITOH SATOMI;NAMIKAWA YASUO |
分类号 |
H01L29/24 |
主分类号 |
H01L29/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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