发明名称 COMPOSITE SUBSTRATE HAVING SINGLE-CRYSTAL SILICON CARBIDE SUBSTRATE
摘要 A first vertex of a first single-crystal silicon carbide substrate and a second vertex of a second single-crystal silicon carbide substrate abut each other such that a first side of the first single-crystal silicon carbide substrate and a second side of the second single-crystal silicon carbide substrate are aligned. In addition, at least a part of the first side and at least a part of the second side abut on a third side of a third single-crystal silicon carbide substrate. Thus, in manufacturing a semiconductor device including a composite substrate, process fluctuations caused by a gap between the single-crystal silicon carbide substrates can be suppressed.
申请公布号 US2012273800(A1) 申请公布日期 2012.11.01
申请号 US201113395494 申请日期 2011.06.17
申请人 HORI TSUTOMU;HARADA SHIN;INOUE HIROKI;SASAKI MAKOTO;ITOH SATOMI;NAMIKAWA YASUO;SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HORI TSUTOMU;HARADA SHIN;INOUE HIROKI;SASAKI MAKOTO;ITOH SATOMI;NAMIKAWA YASUO
分类号 H01L29/24 主分类号 H01L29/24
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