| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a CE of an LPP type EUV light generation apparatus. <P>SOLUTION: A method for generating extreme ultraviolet light may include: a step (a) of supplying a droplet of a target material into a chamber; a step (b) of diffusing the droplet by irradiating the droplet with a pre-pulse laser beam to form a desired diffused target; and a step (c) of generating a plasma to generate extreme ultraviolet light, the plasma being generated by irradiating the desired diffused target with a main pulse laser beam while the main pulse laser beam has such a cross-sectional shape perpendicular to a laser beam axis thereof that the cross-sectional shape is substantially coincident with a shape of the diffused target, as viewed from the direction of the laser beam axis, at an irradiation point of the diffused target. <P>COPYRIGHT: (C)2013,JPO&INPIT |
