| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a rolled copper foil which has excellent flexibility and satisfactory surface etching property, a method for producing the copper foil, and a copper laminated plate. <P>SOLUTION: The copper foil has an I(200)/I0(200) of 50 or more after annealed for 0.5 hour at 200°C. When the copper foil is examined with a stylus contact type surface roughness tester and the average length of contour elements defined in JIS-B0601 is expressed by Rsm, the ratio of the value RsmRD measured in a direction parallel to the rolling direction to the value RsmTD measured in a direction perpendicular to the rolling direction, RsmTD/RsmRD, is 2.0 or greater. In the copper foil after annealed for 0.5 hour at 200°C, the areal proportion of crystal grains which have a major-axis length of 20 μm or shorter in a 0.5 mm square region in the surface (rolled surface) is 20% or more. When a length of 0.5 mm along the rolling direction on a cross-section of the copper foil which is parallel to the rolling direction is examined with an SEM, the areal proportion of crystal grains which are present across the center of the copper foil thickness and have a major-axis length of 20 μm or shorter is 20% or less of the field of view. <P>COPYRIGHT: (C)2013,JPO&INPIT |
