| 发明名称 |
METHOD AND SYSTEM FOR BINDING HALIDE-BASED CONTAMINANTS |
| 摘要 |
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.
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| 申请公布号 |
US2012276750(A1) |
申请公布日期 |
2012.11.01 |
| 申请号 |
US201213541435 |
申请日期 |
2012.07.03 |
| 申请人 |
DERDERIAN GARO J.;BASCERI CEM;WESTMORELAND DONALD L.;MICRON TECHNOLOGY, INC. |
发明人 |
DERDERIAN GARO J.;BASCERI CEM;WESTMORELAND DONALD L. |
| 分类号 |
H01L21/31;B32B9/00;B32B15/00;C01B21/076;C01B33/06;C01B35/04;C22C14/00 |
主分类号 |
H01L21/31 |
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