发明名称 |
ULTRASONIC TREATMENT METHOD AND APPARATUS |
摘要 |
Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.
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申请公布号 |
US2012273363(A1) |
申请公布日期 |
2012.11.01 |
申请号 |
US201113096809 |
申请日期 |
2011.04.28 |
申请人 |
HOLSTEYNS FRANK;LIPPERT ALEXANDER;LAM RESEARCH AG |
发明人 |
HOLSTEYNS FRANK;LIPPERT ALEXANDER |
分类号 |
H01L21/306;B08B3/12;C25D5/00;C25D7/12 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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