发明名称 CHARGED PARTICLE SYSTEM FOR PROCESSING A TARGET SURFACE
摘要 <p>The invention relates to a charged particle system for processing a target surface with at least one charged particle beam. The system comprises an optical column with a beam generator module for generating a plurality of charged particle beams, a beam modulator module for switching on and off said plurality of beams and a beam projector module for projecting beams or subbeams on said target surface. The system further comprises a frame supporting each of said modules in a fixed position and alignment elements for aligning at least one of beams and/or subbeams with a downstream module element.</p>
申请公布号 WO2012148274(A1) 申请公布日期 2012.11.01
申请号 WO2012NL50289 申请日期 2012.04.27
申请人 MAPPER LITHOGRAPHY IP B.V.;VAN DEN BROM, ALRIK;STEENBRINK, STIJN WILLEM HERMAN KAREL;WIELAND, MARCO JAN-JACO;DE BOER, GUIDO;KAPPELHOF, PIETER 发明人 VAN DEN BROM, ALRIK;STEENBRINK, STIJN WILLEM HERMAN KAREL;WIELAND, MARCO JAN-JACO;DE BOER, GUIDO;KAPPELHOF, PIETER
分类号 H01J37/317;G03F7/20;H01J37/067;H01J37/20 主分类号 H01J37/317
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