发明名称 ION BEAM DEVICE AND PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a device and a method for processing an object to be processed, such as a sample, a probe, a sample stand, without requiring a high device operation skill. <P>SOLUTION: At first, the shape generation processing for determining the shape of an object to be processed based on the scanning signal of an ion beam and the absorption current of the object to be processed is performed, and then the processing pattern arrangement processing for arranging a processing pattern on the image of the object to be processed is performed. Furthermore, the ion beam stop processing for stopping ion beam irradiation is performed while the object to be processed is processed by ion beam irradiation based on the comparison results of the image of the object to be processed and the processing pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012212616(A) 申请公布日期 2012.11.01
申请号 JP20110078432 申请日期 2011.03.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KITAYAMA MASAYA;TOMIMATSU SATOSHI;ONISHI TAKESHI
分类号 H01J37/317;H01J37/20;H01J37/244 主分类号 H01J37/317
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