发明名称 |
SUBSTRATE FOR EUVL OPTICAL MEMBER |
摘要 |
<p>The present invention relates to a substrate for EUV lithography optical member, comprising a silica glass containing TiO2, in which the substrate has two opposite surfaces, and the substrate has temperatures at which a coefficient of linear thermal expansion (CTE) is 0 ppb/° C. (Cross-Over Temperature: COT), and in which the two opposite surfaces have difference in the COTs of 5° C. or more.</p> |
申请公布号 |
EP2516340(A2) |
申请公布日期 |
2012.10.31 |
申请号 |
EP20100805850 |
申请日期 |
2010.12.24 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
MIYASAKA, JUNKO;KOIKE, AKIO;OGAWA, TOMONORI |
分类号 |
C03C3/06;C03B20/00;G02B1/00;G03F1/22;G03F1/24;H01L21/027 |
主分类号 |
C03C3/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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