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经营范围
发明名称
Antireflection film composition, substrate, and pattering process
摘要
申请公布号
EP1813985(B1)
申请公布日期
2012.10.31
申请号
EP20070001328
申请日期
2007.01.22
申请人
SHIN-ETSU CHEMICAL CO., LTD.
发明人
OGIHARA, TSUTOMU;IWABUCHI, MOTOAKI;ASANO, TAKESHI;UEDA, TAKAFUMI
分类号
G03F7/075;G03F7/09
主分类号
G03F7/075
代理机构
代理人
主权项
地址
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