| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antireflective stack, e.g., in an antireflective film in which a low reflective index layer is formed on a transparent base material as an essential constituting layer, where, when a monomer for reducing the reflective index is used, it is not made non-compatible to a binder resin and a solvent, thus the generation of repelling damaging appearance caused by the non-compatibility and deterioration in film strength caused by the solidification of the non-compatible parts can be prevented. <P>SOLUTION: The antireflective stack is obtained by forming two or more constituting layers in which a low refractive index layer(s) having optical transparency is used as at least one constituting layer, on the transparent base material. As the low reflective index layer(s), a coating composition comprising: (1) a fluorine atom-containing monomer with a repeated unit of alkyl chains substituted with fluorine via ether linkage; (2) a binder component having ionizing radiation curability; and (3) an organic solvent as an essential component, is applied to the face to be coated, so as to be cured into a cured layer. <P>COPYRIGHT: (C)2008,JPO&INPIT |
