发明名称 Vacuum film formation method and laminate obtained by the method
摘要 A method of continuously subjecting an elongated substrate to vacuum film formation is disclosed. The method comprises the steps of: feeding a first substrate from a first roll chamber in a first direction from the first chamber toward a second roll chamber; degassing the first substrate; forming a film of a second material on the first substrate, in a second film formation chamber; and rolling up the first substrate in the second roll chamber, thereby producing the first substrate, and further comprises similar steps to produce a second substrate. In advance of producing the first substrate with the second material film, the first cathode electrode of the first film formation chamber is removed from the first film formation chamber, and, in advance of producing the second substrate with the first material film, the second cathode electrode of the second film formation chamber is removed from the second film formation chamber.
申请公布号 EP2518761(A1) 申请公布日期 2012.10.31
申请号 EP20120165705 申请日期 2012.04.26
申请人 NITTO DENKO CORPORATION 发明人 NASHIKI, TOMOTAKE;SUGAWARA, HIDEO;NOGUCHI, TOMONORI;HAMADA, AKIRA;ITO, YOSHIHISA;ISHIBASHI, KUNIAKI
分类号 H01L21/67;C23C14/08;C23C14/56;C23C28/00 主分类号 H01L21/67
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