发明名称 |
A pellicle for lithography |
摘要 |
A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the pellicle is attached so that pattern transferred scarcely undergoes deformation; in particular the agglutinant layer has a Young's modulus of 0.02 to 0.08 MPa and a tensile bond strength of 0.04 to 0.08 N/mm 2 . |
申请公布号 |
EP2518561(A1) |
申请公布日期 |
2012.10.31 |
申请号 |
EP20120162067 |
申请日期 |
2012.03.29 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TSUKADA, JUNICHI;SHIRASAKI, TORU |
分类号 |
G03F1/62;G03F1/64 |
主分类号 |
G03F1/62 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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