发明名称 |
Polymeric compound, positive resist composition, and method of forming resist pattern |
摘要 |
A polymeric compound including a structural unit (a0) represented by the structural unit (a0-1) shown below: (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; R5 represents an alkyl group; R6 represents a substituent selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group; and e represents an integer of 0 to 5). |
申请公布号 |
US8298745(B2) |
申请公布日期 |
2012.10.30 |
申请号 |
US20080451971 |
申请日期 |
2008.06.11 |
申请人 |
FURUYA SANAE;DAZAI TAKAHIRO;KOHNO SHINICHI;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
FURUYA SANAE;DAZAI TAKAHIRO;KOHNO SHINICHI |
分类号 |
G03F7/004;C08F32/02;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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