发明名称 Photosensitive resin composition and light blocking layer using the same
摘要 Disclosed are a photosensitive resin composition and a light blocking layer using the same. The photosensitive resin composition includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, wherein the substituents of Chemical Formula 1 and Chemical Formula 2 are the same as defined in the detailed description, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent.
申请公布号 US8298454(B2) 申请公布日期 2012.10.30
申请号 US201113241434 申请日期 2011.09.23
申请人 CHEIL INDUSTRIES INC. 发明人 LEE CHANG-MIN;KIM JUN-SEOK;LEE KIL-SUNG;KIM MIN-SUNG
分类号 G02B5/23;C08F2/46;C08F2/50;C08J3/28;G03F7/032;G03F7/033 主分类号 G02B5/23
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