发明名称 Electronic device including a buried insulating layer and a vertical conductive structure extending therethrough and a process of forming the same
摘要 An electronic device can include a buried conductive region, a buried insulating layer over the buried conductive region, and a semiconductor layer disposed over the buried insulating layer, wherein the semiconductor layer has a primary surface and an opposing surface, and the buried conductive region is disposed closer to the opposing surface than to the primary surface. The electronic device can also include a current-carrying electrode of a first transistor, wherein the current carrying electrode is disposed along the primary surface and spaced apart from the buried conductive layer. The electronic device can also include a vertical conductive structure extending through the buried insulating layer, wherein the vertical conductive structure is electrically connected to the current-carrying electrode and the buried conductive region.
申请公布号 US8299560(B2) 申请公布日期 2012.10.30
申请号 US20100702055 申请日期 2010.02.08
申请人 LOECHELT GARY H.;GRIVNA GORDON M.;ZDEBEL PETER J.;SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC 发明人 LOECHELT GARY H.;GRIVNA GORDON M.;ZDEBEL PETER J.
分类号 H01L21/70 主分类号 H01L21/70
代理机构 代理人
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