发明名称 Semiconductor device, circuit substrate, and electronic device
摘要 A semiconductor device has a through electrode formed in a through hole which penetrates a Si substrate from one surface to the other surface of the Si substrate, wherein a rectangular electrode pad is provided on the other surface with an insulation film laid between the electrode pad and the other surface, an opening of the through hole on the one surface side is circular, an opening of the through hole on the other surface side is rectangular, and the area of the opening on the other surface side is made smaller than the area of the opening on the one surface side.
申请公布号 US8299624(B2) 申请公布日期 2012.10.30
申请号 US20100877317 申请日期 2010.09.08
申请人 MATSUO YOSHIHIDE;SEIKO EPSON CORPORATION 发明人 MATSUO YOSHIHIDE
分类号 H01L23/48;H01L23/52;H01L29/40 主分类号 H01L23/48
代理机构 代理人
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