GLASS DEPOSITION APPARATUS

摘要

PURPOSE: A substrate deposition apparatus is provided to prevent sputtered particles from being diffused toward a substrate transfer support or a heater out of a non-deposition area of a substrate by employing a baffle-type mask shield. CONSTITUTION: A substrate deposition apparatus comprises a chamber body(110) and a baffle-type mask shield(170). The chamber body provides an internal space for implementing deposition on a substrate. The baffle-type mask shield is arranged close to a non-deposition area at the edge of the substrate within the chamber body and has a duct structure that forms a suction path for a deposition material not to diffuse to the inner wall of the chamber body out of the non-deposition area during deposition on the substrate.