发明名称 EXPOSING METHOD USING MASKLESS EXPOSURE APPARATUS AND METHOD OF FABRICATING LIQUID CRYSTAL DISPLAY USING THEREOF
摘要 PURPOSE: An exposure method using a maskless exposure device and a manufacturing method of a liquid crystal display device using the same are provided to shorten exposure tact time and to minimize the errors of patterns due to a stage driving operation. CONSTITUTION: A maskless exposure device includes a flat stage and a digital micro-mirror device(DMD) array(150). The stage is arranged on a base and supports a substrate(101). The DMD array is composed of a plurality of DMDs over the base. An exposure method using the maskless exposure device includes the following: the maskless exposure device is prepared; a substrate with a first coated layer is loaded on the stage; the entire surface of the substrate is exposed by using the DMD array; a substrate with a second coated layer is loaded on the stage; and the DMD array is divided into a plurality of exposure areas and selectively operate the exposure areas for exposing the substrate.
申请公布号 KR20120118822(A) 申请公布日期 2012.10.29
申请号 KR20110036435 申请日期 2011.04.19
申请人 LG DISPLAY CO., LTD.;LG ELECTRONICS INC. 发明人 PARK, WON DEOK;CHOI, JONG RYUL;YANG, NAM YEOL;KIM, KUN SOO;PARK, MYUNG JOO;RHEE, CHANG JU;SHIN, YOUNG HOON
分类号 G03F7/20;G02F1/13 主分类号 G03F7/20
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