发明名称 SILICA-COATING-FORMING COMPOSITION FOR USE WITH INKJETS, METHOD FOR FORMING SILICA COATING, SEMICONDUCTOR DEVICE, AND SOLAR-CELL SYSTEM
摘要 <p>The present invention relates to a silica-coating-forming composition for use with inkjets, said composition containing the following: a silicon compound obtained by hydrolytic polycondensation of a compound represented by the general formula R1 nSiX4-n (R1 representing a C1-20 organic group, X representing a hydrolyzable group, and n representing an integer from 0 to 2); solvents including gamma-butyrolactone, a second solvent having a boiling point of 80°C to 100°C, and a third solvent having a boiling point of 180°C to 230°C; and a surface conditioner. Gamma-butyrolactone constitutes at least 20% of the total mass of the solvents, and the second solvent constitutes 20% to 50% of the total mass of the solvents.</p>
申请公布号 WO2012144291(A1) 申请公布日期 2012.10.26
申请号 WO2012JP57555 申请日期 2012.03.23
申请人 HITACHI CHEMICAL COMPANY, LTD.;OKADA YUUHEI;YOSHIKAWA TAKAHIRO;NOBE SHIGERU 发明人 OKADA YUUHEI;YOSHIKAWA TAKAHIRO;NOBE SHIGERU
分类号 C09D11/00;B41M5/00;H01L21/312;H01L31/04 主分类号 C09D11/00
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