发明名称 |
METHOD FOR DEPOSITING AN ANTIREFLECTIVE LAYER ON A SUBSTRATE |
摘要 |
A method for the deposition of an anti-reflection film on a substrate is disclosed. A substrate including a plurality of solar cell structures is provided and placed in a vacuum chamber with a target including silicon. A flow of a nitrogen-containing reactive gas into the vacuum chamber is set to a first value while a voltage between the target and ground is switched off and then increased to a second value. A voltage is applied between the target and ground, whereby a film of silicon and nitrogen is deposited on the substrate in a flow of the nitrogen-containing reactive gas which is higher than the first value. |
申请公布号 |
KR20120118461(A) |
申请公布日期 |
2012.10.26 |
申请号 |
KR20127017596 |
申请日期 |
2011.01.19 |
申请人 |
OC OERLIKON BALZERS AG |
发明人 |
RATTUNDE OLIVER;VOSER STEPHAN |
分类号 |
C23C14/00;C23C14/06;C23C14/24;H01L31/0216 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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