发明名称 POST-HEATABLE SUBSTRATE
摘要 <p>PURPOSE: A substrate capable of post heat treatment is provided to prevent coherence of thermochromic materials in the post-heat treatment process of the substrate. CONSTITUTION: A substrate capable of post heat treatment comprises a substrate(100), a thermochromic thin film(200), sub-layers(300) and sacrificing layers(400). The thermochromic thin film is formed on the substrate. The sub-layer is formed on the upper and lower surfaces of the thermochromic thin film. The sacrificing layer is formed between the thermochromic thin film and the sub-layer, and is composed of non-oxidized metal. The thermochromic thin film is vanadium dioxide(VO2). The sub-layer is oxide film or nitride film. The non-oxidized metal is one of titanium (Ti), nichrome (NiCr), chrome (Cr), nickel (Ni), aluminum (Al), NB, silicon (Si), zinc (Zn), tin (Sn) or an alloy thereof.</p>
申请公布号 KR20120118304(A) 申请公布日期 2012.10.26
申请号 KR20110035790 申请日期 2011.04.18
申请人 SAMSUNG CORNING PRECISION MATERIALS CO., LTD. 发明人 JUNG, YOUNG SOO;SHIM, MYUN GI;MOON, DONG GUN;RYU, SANG RYOUN
分类号 C03C17/34;C03C17/23;C03C17/36;G02F1/00 主分类号 C03C17/34
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