发明名称 |
CLEANING METHOD OF THIN FILM FORMATION APPARATUS, THIN FILM FORMATION METHOD, AND THIN FILM FORMATION APPARATUS |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a cleaning method and the like of a thin film formation apparatus which improves the etching rate for extraneous matter adhered to the interior of the apparatus and the selection ratio thereby reducing a burden to a gas supply device. <P>SOLUTION: A control part 100 controls a heater for heat-up 16 to heat the interior of a reaction tube 2 to a predetermined temperature and supplies a cleaning gas containing a fluorine gas and a silane gas from a processing gas introduction tube 17 to the reaction tube 2 with the reaction tube 2 heated to the predetermined temperature. The supplied cleaning gas is activated in the reaction tube 2 and removes extraneous matter adhered to the interior of a thin film formation apparatus 1 thereby cleaning the interior of the thin film formation apparatus 1. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2012209411(A) |
申请公布日期 |
2012.10.25 |
申请号 |
JP20110073589 |
申请日期 |
2011.03.29 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
OKADA MITSUHIRO;TOJO YUKIO;TAGO KENJI;NISHIMURA KAZUAKI |
分类号 |
H01L21/31;C23C16/44 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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