发明名称 SELECT DEVICES
摘要 Methods, devices, and systems are provided for a select device that can include a semiconductive stack of at least one semiconductive material formed on a first electrode, where the semiconductive stack can have a thickness of about 700 angstroms (Å) or less. Each of the at least one semiconductive material can have an associated band gap of about 4 electron volts (eV) or less and a second electrode can be formed on the semiconductive stack.
申请公布号 US2012267632(A1) 申请公布日期 2012.10.25
申请号 US201113089648 申请日期 2011.04.19
申请人 RAMASWAMY D.V. NIRMAL;SANDHU GURTEJ S.;MICRON TECHNOLOGY, INC. 发明人 RAMASWAMY D.V. NIRMAL;SANDHU GURTEJ S.
分类号 H01L29/12;H01L21/20 主分类号 H01L29/12
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