| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide, for example, an arrangement which addresses some problems associated with movement of a support. <P>SOLUTION: An apparatus, in an embodiment, has a patterning device support including a first planar element having a first flow-restricting surface; a second planar element including a second flow-restricting surface facing the first flow-restricting surface; a support driver to linearly move the support along a certain direction relative to the second planar element. The first and/or second flow-restricting surface has one or more projections and/or recesses between the first and second flow-restricting surfaces. The projection and/or recess on the first and/or second flow-restricting surface is arranged to provide a flow resistance, per unit width of the first and/or second flow-restricting surface perpendicular to a flow, that is lower against a flow that is parallel to the certain direction than against a flow that is perpendicular to the certain direction. The flow-restricting surfaces may direct a gas flow onto a driver part that generates heat. <P>COPYRIGHT: (C)2013,JPO&INPIT |
