| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a sputtering target for a permanent magnet thin film which can improve the magnetic properties of a permanent magnet thin film such as an Nd-Fe-B based permanent magnet thin film, and a method for producing the same. <P>SOLUTION: The sputtering target is composed of a sintered compact represented by a compositional formula in atomic ratio of R<SB POS="POST">x</SB>T<SB POS="POST">100-x-y</SB>M<SB POS="POST">y</SB>(R denotes at least one kind among rare earth elements, wherein Nd and/or Pr is necessarily included; T denotes at least one kind among transition elements, wherein Fe is necessarily included; and M denotes B or B and C, wherein 50 atomic%≤B/M is satisfied), and in which x and y satisfy 17≤x≤20, and 7≤y≤10, and having an oxygen content of ≤1,500 ppm. <P>COPYRIGHT: (C)2013,JPO&INPIT |
