| 发明名称 |
RESIST UNDERLAYER COMPOSITION AND METHOD OF MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES USING THE SAME |
| 摘要 |
A resist underlayer composition, including a solvent, and an organosilane condensation polymerization product including about 10 to about 40 mol % of a structural unit represented by Chemical Formula 1:
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| 申请公布号 |
US2012270143(A1) |
申请公布日期 |
2012.10.25 |
| 申请号 |
US201213539894 |
申请日期 |
2012.07.02 |
| 申请人 |
YUN HUI-CHAN;KIM SANG-KYUN;CHO HYEON-MO;KIM MI-YOUNG;KOH SANG-RAN;CHUNG YONG-JIN;KIM JONG-SEOB |
发明人 |
YUN HUI-CHAN;KIM SANG-KYUN;CHO HYEON-MO;KIM MI-YOUNG;KOH SANG-RAN;CHUNG YONG-JIN;KIM JONG-SEOB |
| 分类号 |
C08L83/04;B32B3/30;C08K5/3432;G03F7/20 |
主分类号 |
C08L83/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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