发明名称 CORRECTION METHOD OF NOZZLE EJECTION RATE, EJECTION METHOD OF DROPLET AND MANUFACTURING METHOD OF ORGANIC EL ELEMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a correction method of a nozzle ejection rate capable of calibrating variations in weight of droplets ejected from a nozzle with high accuracy, and further to provide an ejection method of the droplets using the correction method thereof and a manufacturing method of an organic EL element. <P>SOLUTION: A correction method of a nozzle ejection rate in one embodiment performs correction amount calculations by the number of nozzle row units in a stepwise manner such that a total value C of weight of droplets of nozzle row units after correction and weight of droplets of other nozzle row units performing ejection to an ejection area becomes a predetermined amount B from a difference between a total value A of weight of all droplets ejected to the ejection area when weight correction of droplets ejected from a nozzle is not performed and a predetermined amount B set beforehand. Correction as described above may be performed by using ejection units or scan units as a reference. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012209216(A) 申请公布日期 2012.10.25
申请号 JP20110075810 申请日期 2011.03.30
申请人 SEIKO EPSON CORP 发明人 KITABAYASHI ATSUSHI
分类号 H05B33/10;B05D1/26;H01L51/50 主分类号 H05B33/10
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