| 摘要 |
Provided is a gas-barrier multilayer film which is superior in gas-barrier properties and interlayer adhesion property, and which exhibits less deterioration in gas-barrier properties and is resistant to interlayer delamination even in prolonged exposure to a high-temperature and high-humidity environment or after a retort treatment. A gas-barrier multilayer film, wherein (A) a first inorganic thin film layer, (C) a gas-barrier resin composition layer, and (D) a second inorganic thin film layer are stacked in this order with or without intervention of other layers on at least one surface of a plastic film, the gas-barrier resin composition layer (C) is formed from a gas-barrier resin composition comprising (a) a gas-barrier resin including an ethylene-vinyl alcohol-based copolymer, (b) an inorganic layered compound, and (c) at least one additive selected from coupling agents and crosslinking agents, and the content of the inorganic layered compound (b) in the gas-barrier resin composition is from 0.1% by mass to 20% by mass based on 100% by mass in total of the gas-barrier resin (a), the inorganic layered compound (b), and the additive (c).
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