发明名称 MANUFACTURING METHOD OF TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE FILM, TRANSPARENT CONDUCTIVE SUBSTRATE, AND DEVICE USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a transparent conductive film which is formed by a coating method as a low-cost and simple manufacturing method of transparent conductive film, has high conductivity and is endowed with excellent film strength and superior transparency, and to provide the manufacturing method of this transparent conductive film. <P>SOLUTION: An oxidation firing process is a process in which, in an oxygen-containing atmosphere, the temperature of a dried coating film is raised up to not lower than the calcination temperature at which at least the crystallization of inorganic components occurs, organic components are removed by thermal decomposition or combustion, or the thermal decomposition and combustion, and a conductive oxide particulate film is formed by being densely filled with conductive oxide particulates each containing a dopant metal compound and having an indium oxide as a main component. In a reduction firing process, the conductive oxide particulate film formed in the oxidation firing process contains at least hydrogen of 0.1 percent by volume or more and steam, and the firing is performed at a temperature of 300&deg;C or more in a reducing atmosphere in which the dew point temperature is -55 to 30&deg;C. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012209123(A) 申请公布日期 2012.10.25
申请号 JP20110073682 申请日期 2011.03.29
申请人 SUMITOMO METAL MINING CO LTD 发明人 OTSUKA YOSHIHIRO;YUKINOBU MASAYA
分类号 H01B13/00;C01G15/00;C01G19/00;G02F1/1343;G06F3/041;H01B5/14;H01L31/04;H01L51/50;H05B33/28 主分类号 H01B13/00
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