发明名称 METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE, ELECTRO-OPTIC DEVICE, PROJECTION-TYPE DISPLAY DEVICE, AND ELECTRONIC EQUIPMENT
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electro-optic device that achieves reduction in a polishing time and a formation time of a conductive film for plug electrode formation when obtaining conduction between conductive layers by a plug electrode provided in a hole of an insulating film, an electro-optic device, a projection-type display device, and electronic equipment. <P>SOLUTION: In an element substrate of a liquid crystal device, when a second electrode layer 7a and a pixel electrode 9a are to be electrically connected with each other via a plug electrode 8a provided in a hole 48a of an interlayer insulating film 48, the plug electrode 8a is formed to fill a contact hole 46a provided in a first insulating film 46, and thereafter, a second insulating film 47 is formed. Further, the plug electrode 8a is exposed by polishing the second insulating film 47 from its surface, and thereafter, the pixel electrode 9a is formed on the surface of the second insulating film 47. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012208294(A) 申请公布日期 2012.10.25
申请号 JP20110073545 申请日期 2011.03.29
申请人 SEIKO EPSON CORP 发明人 ITO SATOSHI;YAMAJI SHIGEFUMI
分类号 G09F9/00;G02F1/1368;G09F9/30 主分类号 G09F9/00
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