| 摘要 |
An exposure apparatus according to this invention uses both a first light source which outputs a light beam corresponding to a drive current corresponding to image information, and a second light source to irradiate the surface of a photosensitive drum with a plurality of light beams. The second laser light source irradiates the photosensitive drum with a laser beam in accordance with a drive current corresponding to a correction value according to which unevenness of potential characteristics due to unevenness of sensitivity of the surface of the photosensitive drum is reduced. The same region on the surface of the photosensitive drum is irradiated with laser beams which are output from the first and second laser light sources onto the photosensitive drum in superposition. |
